Publications

2021

Francois Weisbuch, Jirka Schatz, Sylvio Mattick, Nivea Schuch, Thiago Figueiro, and Patrick Schiavone "Investigating SEM-contour to CD-SEM matching", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116110Y (9 March 2021) ; https://doi.org/10.1117/12.2583715

Bertrand Le Gratiet, Régis Bouyssou, Julien Ducoté, Alain Ostrovsky, Stephanie Audran, Christian Gardin, Nivea G. Schuch, Charles Valade, Jordan Belissard, Matthieu Millequant, Thiago Figueiro, and Patrick Schiavone "Pattern placement and shape distortion control using contour-based metrology", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116110Z (10 March 2021) ; https://doi.org/10.1117/12.2584364

Nivea G. Schuch, Mohamed Abaidi, Thiago Figueiro, Patrick Schiavone, and Matthew Sendelbach "Contour metrology accuracy assessment using TMU analysis", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161114 (23 February 2021) ; https://doi.org/10.1117/12.2584617

Jonathan Pradelles, Loïc Perraud, Aurélien Fay, Elie Sezestre, Jean-Baptiste Henry, Jessy Bustos, Estelle Guyez, Sébastien Berard-Bergery, Aurélie Le Pennec, Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Matthieu Millequant, Thiago Figueiro, and Patrick Schiavone "Roughness measurement of 2D curvilinear patterns : challenges and advanced methodology", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161110 (22 February 2021) ; https://doi.org/10.1117/12.2583843

Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Thiago Figueiro, Matthieu Millequant, Jonathan Pradelles, Loïc Perraud, Aurélien Fay, Jessy Bustos, Jean-Baptiste Henry, Estelle Guyez, Sébastien Berard-Bergery, and Patrick Schiavone "Determining the validity domain of roughness measurements as a function of CD-SEM acquisition conditions", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 1161118 (22 February 2021) ; https://doi.org/10.1117/12.2584040

2020

Bertrand Le-Gratiet, Régis Bouyssou, Julien Ducoté, Alain Ostrovsky, Charlotte Beylier, Christian Gardin, Nivea Schuch, Vincent Annezo, Loïc Schneider, Matthieu Millequant, Paolo Petroni, Thiago Figueiro, and Patrick Schiavone "Contour based metrology : “make measurable what is not so"", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 1132505 (27 March 2020) ; https://doi.org/10.1117/12.2551907

2019

Bertrand Le Gratiet, Régis Bouyssou, Julien Ducoté, Christophe Dezauzier, Alain Ostrovsky, Charlotte Beylier, Christian Gardin, Paolo Petroni, Matthieu Milléquant, Alexandre Chagoya-Garzon, and Patrick Schiavone "Contour based metrology : getting more from a SEM image", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109591M (26 March 2019) ; https://doi.org/10.1117/12.2511626