Publications

2019

Varvara Brackmann, Michael Friedrich, Clyde Browning, Norbert Hanisch, and Benjamin Uhlig "Influence of the dose assignment and fracturing type on patterns exposed by a variable shaped e-beam writer : simulation vs experiment", Proc. SPIE 11177, 35th European Mask and Lithography Conference (EMLC 2019), 1117713 (29 August 2019) ; https://doi.org/10.1117/12.2534642

2018

A. Fay, A. Girodon, J. Chartoire, J. Hazart, S. Bayle, and P. Schiavone "Variable shaped beam lithography capabilities enhancement by "small-shots" correction", Proc. SPIE 10810, Photomask Technology 2018, 108101D (3 October 2018) ; https://doi.org/10.1117/12.2501823

Clyde Browning, Serguei Postnikov, Matthieu Milléquant, Sébastien Bayle, and Patrick Schiavone "Curvilinear data processing methods and verification", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 107750K (19 September 2018) ; https://doi.org/10.1117/12.2326599

Kenji Kono, Yasuo Kon, Yasunari Tsukino, Sergei Postnikov, Thiago Figueiro, Luc Martin, Paolo Petroni, and Patrick Schiavone "Demonstration of an effective mask proximity correction for advanced photomask", Proc. SPIE 10807, Photomask Japan 2018 : XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 108070A (12 June 2018) ; https://doi.org/10.1117/12.2501785

2017

Sébastien Bayle, Charles Tiphine, Matthieu Milléquant, Thiago Figueiro, Luc Martin, Sergei Postnikov, and Patrick Schiavone "Data preparation in the age of curvilinear patterns", Proc. SPIE 10454, Photomask Japan 2017 : XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540H (13 July 2017) ; https://doi.org/10.1117/12.2280704

2016

Aurélien Fay, Clyde Browning, Pieter Brandt, Jacky Chartoire, Sébastien Bérard-Bergery, Jérôme Hazart, Alexandre Chagoya, Sergei Postnikov, Mohamed Saib, Ludovic Lattard, and Patrick Schavione "Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 977714 (22 March 2016) ; https://doi.org/10.1117/12.2219178

Bastien Orlando, Vincent Farys, Loïc Schneider, Sébastien Cremer, Sergei V. Postnikov, Matthieu Millequant, Mathieu Dirrenberger, Charles Tiphine, Sébastian Bayle, Céline Tranquillin, and Patrick Schiavone "OPC for curved designs in application to photonics on silicon", Proc. SPIE 9780, Optical Microlithography XXIX, 97801U (15 March 2016) ; https://doi.org/10.1117/12.2230400

Mohamed Abaidi, Mohamed Saib, Jean-Hervé Tortai, and Patrick Schiavone "Improvement of Electron Beam Lithography modeling for overdose exposures by using Dill transformation", Proc. SPIE 9985, Photomask Technology 2016, 998507 (26 September 2016) ; https://doi.org/10.1117/12.2240928

2015

Brian Dillon, Mohamed Saib, Thiago Figueiro, Paolo Petroni, Chris Progler, and Patrick Schiavone "Mask process matching using a model based data preparation solution", Proc. SPIE 9635, Photomask Technology 2015, 96350T (23 October 2015) ; https://doi.org/10.1117/12.2199273

Xaver Thrun, Clyde Browning, Kang-Hoon Choi, Thiago Figueiro, Christoph Hohle, Mohamed Saib, Patrick Schiavone, and Johann W. Bartha "Sensitivity analysis for high accuracy proximity effect correction", Proc. SPIE 9635, Photomask Technology 2015, 963515 (23 October 2015) ; https://doi.org/10.1117/12.2197175

Pieter Brandt, Céline Tranquillin, Marco Wieland, Sébastien Bayle, Matthieu Milléquant, and Guillaume Renault "Alternative stitching method for massively parallel e-beam lithography", Journal of Micro/Nanolithography, MEMS, and MOEMS 14(3), 031203 (2 July 2015). https://doi.org/10.1117/1.JMM.14.3.031203

2014

Clyde Browning, Thomas Quaglio, Thiago Figueiro, Sébastien Pauliac, Jérôme Belledent, Aurélien Fay, Jessy Bustos, Jean-Christophe Marusic, and Patrick Schiavone "Photonic curvilinear data processing", Proc. SPIE 9235, Photomask Technology 2014, 92350V (29 October 2014) ; https://doi.org/10.1117/12.2069335

Kang-Hoon Choi, Clyde Browning, Thiago Figueiro, Christoph Hohle, Michael Kaiser, and Patrick Schiavone "Effective corner rounding correction in the data preparation for electron beam lithography", Proc. SPIE 9235, Photomask Technology 2014, 92350U (8 October 2014) ; https://doi.org/10.1117/12.2066156

P. Brandt, J. Belledent, C. Tranquillin, T. Figueiro, S. Meunier, S. Bayle, A. Fay, M. Milléquant, B. Icard, and M. Wieland "Demonstration of EDA flow for massively parallel e-beam lithography", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904915 (28 March 2014) ; https://doi.org/10.1117/12.2046091

2013

Thiago Figueiro, Clyde Browning, Martin J. Thornton, Cyril Vannuffel, Kang-Hoon Choi, Christoph Hohle, Jean-Herve Tortai, and Patrick Schiavone "Extreme long range process effects characterization and compensation", Proc. SPIE 8886, 29th European Mask and Lithography Conference, 88860F (1 October 2013) ; https://doi.org/10.1117/12.2030664

Thiago Figueiro, Mohamed Saib, Kang-Hoon Choi, Christoph Hohle, Martin J. Thornton, Cyril Vannufel, Jean-Hervé Tortai, and Patrick Schiavone "Metrology variability and its impact in process modeling", Proc. SPIE 8880, Photomask Technology 2013, 888020 (23 September 2013) ; https://doi.org/10.1117/12.2026423

Russell Cinque, Tadashi Komagata, Taiichi Kiuchi, Clyde Browning, Patrick Schiavone, Paolo Petroni, Luc Martin, and Thomas Quaglio "Shot count reduction for non-Manhattan geometries : concurrent optimization of data fracture and mask writer design", Proc. SPIE 8880, Photomask Technology 2013, 88801F (9 September 2013) ; https://doi.org/10.1117/12.2028944

Patrick Schiavone, Alexandre Chagoya, Luc Martin, Vincent Annezo, and Alexis Blanchemain "Verification : an enabler for model based data preparation", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010E (28 June 2013) ; https://doi.org/10.1117/12.2032321

Xaver Thrun, Kang-Hoon Choi, Norbert Hanisch, Christoph Hohle, Katja Steidel, Douglas Guerrero, Thiago Figueiro, and Johann W. Bartha "Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86820Z (29 March 2013) ; https://doi.org/10.1117/12.2011461

Thiago Figueiro, Clyde Browning, Martin J. Thornton, Cyril Vannufel, and Patrick Schiavone "Reticle level compensation for long range effects", Proc. SPIE 8680, Alternative Lithographic Technologies V, 868028 (26 March 2013) ; https://doi.org/10.1117/12.2011835

2012

Thiago Figueiro, Kang-Hoon Choi, Manuela Gutsch, Martin Freitag, Christoph Hohle, Jean-Hervé Tortai, Mohamed Saib, and Patrick Schiavone "Advanced module for model parameter extraction using global optimization and sensitivity analysis for electron beam proximity effect correction", Proc. SPIE 8522, Photomask Technology 2012, 852212 (8 November 2012) ; https://doi.org/10.1117/12.965312

T. Figueiro, M. Saib, N. Jedidi, and P. Schiavone "Improved electron backscattering representation using a new class of distribution : application to EUV masks", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83232F (21 March 2012) ; https://doi.org/10.1117/12.916419

P. Schiavone, L. Martin, C. Browning, V. Farys, F. Sundermann, S. Narukawa, T. Takikawa et N. Hayashi, “A novel mask proximity correction software combining accuracy and reduced writing time for the manufacturing of advanced photomasks”, in Proc. SPIE, (2012). https://doi.org/10.1117/12.981609

Luc Martin, Serdar Manakli, Sebastien Bayle, Jérôme Belledent, Sebastien Soulan, Pablo Wiedemann, Abdi Farah, and Patrick Schiavone "Combined dose and geometry correction (DMG) for low energy multi electron beam lithography (5kV) : application to the 16nm node", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231W (21 March 2012) ; https://doi.org/10.1117/12.916064

2011

Kang-Hoon Choi, Manuela Gutsch, Martin Freitag, Christoph Hohle, Luc Martin, Sebastien Bayle, Serdar Manakli, and Patrick Schiavone "Efficient large volume data preparation for electron beam lithography for sub-45nm node", Proc. SPIE 8166, Photomask Technology 2011, 816621 (13 October 2011) ; https://doi.org/10.1117/12.897586

Luc Martin, Serdar Manakli, Sébastien Bayle, Kang-Hoon Choi, Manuela Gutsch, Jonathan Pradelles, and Jessy Bustos "Data preparation solution for e-beam multiple pass exposure : reaching sub-22nm nodes with a tool dedicated to 45 nm", Proc. SPIE 7970, Alternative Lithographic Technologies III, 797019 (4 April 2011) ; https://doi.org/10.1117/12.879059

2010

L. Martin, S. Manakli, B. Icard, J. Pradelles, R. Orobtchouk, A. Poncet, and L. Pain "Multiple pass exposure in e-beam lithography : application to the sub-22nm nodes", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370E (1 April 2010) ; https://doi.org/10.1117/12.846907